Rapid Thermal Annealing Furnace MTI 1200X-4-RTP

System Specifications:

Maximum Temperature: 1100 ^oC

Maximum Heating rate: 50 ^o C/second (5 ^o C/second above 1000 ^oC)

Sample size: 3” wafers or smaller or wafer fragments.

Working temperature:

Operates at room pressure.   If there is sufficient demand, it can be modified to work under a vacuum.

Standard Gases Supplied:

Argon UHP at up to 4 liters per minute

Oxygen UHP at up to 4 liters per minute

Nitrogen House Gas at up to 4 liters per minute.

Heating and cooling rates:

Maximum heating rate of 50^oC/second.

Recommend heating rate of 5^oC/second.

Maximum cooling rate of 117^oC/minute.

Lowest cooling rate of 10^oC/minute.

Computer based temperature controller with spreadsheet compatible temperature recording.